铝的反应溅射刻蚀

资源类型: 资源大小: 文档分类:社会科学总论 上传者:于红梅

文档信息

【标题】铝的反应溅射刻蚀

【发明人】 Lehmann  Hans W.  Frick  Klaus  Widmer  Roland W. 

【公开日期】1983-06-07

【分类号】C23C 1500

【摘要】An improved sputter etching apparatus for etching a substrate with a reactive gas. The improvement in the apparatus comprises utilizing a cryogenic pump as the vacuum means to evacuate the plasma chamber. The improved apparatus of the invention is particularly useful for the reactive sputter etching of aluminum substrates utilizing a highly reactive gas such as boron trichloride.

【申请号】295513&

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